The Physics Department at the University of Oxford houses the equipment to support a varied range of services, such as:

Central Electronics Services

The Electronics group provides a service in electronics and can be contacted with your requests for construction or repair. The group also offer specialist design advice.

Photofabrication Unit

This facility can provide access to making printed circuit boards and etched components to industry. It can also fabricate stainless steel etched parts, flexible copper circuits and multilayer printed circuits boards. The team also has access to the manufacture of high resolution circuitry using new dry film photoresist.

Crystal Growth and Character

The Crystal Growth group produces a wide range of single crystals using a variety of melt and solution growth techniques. The facility has developed special techniques for the growth of high-quality fluoride crystals under reactive HF atmospheres, for applications such as UV lasers and neutron diffraction.

High Field Magnetic Facility

The High Field Support group provides the UK's highest magnetic fields. The facilities on offer comprise:

• mobile superconducting magnet systems up to 18 T;
• custom-built superconductive magnets dedicated to individual experiments;
• a pulsed field facility based on a 0.8 MJ capacitor bank.

Cryogenic Facilities

The Cryogenic Facilities group offers a 40 litre/hour Linde TCF20 liquefier which can supply liquid helium. The group also provides information and assistance on the design and construction of cryogenic equipment. In addition, the in-house service provides accurate calibration data for most types of cryogenic thermometer in the range 2-300K.

Thin Film Facility

The Thin Film facility provides a comprehensive coating design, manufacture and measurement service. The facility is able to provide custom coatings for the optical, electronic, semiconductor and aerospace fields.

Semiconductor and Superconductor Device Fabrication

The facility can assist with the fabrication of semiconductor and superconductor devices. The equipment housed in the facility allows for the deposition of films of a wide range of materials using thermal or electron beam evaporation, or RF and DC Sputtering. It is also equipped for patterning of the films using electron beam and photolithography and reactive ion or chemical etching. A scanning electron microscope is also available.

 

If you don't see the facility/service that you are looking for, or you would like to discuss your needs in further detail, please contact us on:

T +44 (0)1865 280829
E consulting@isis.ox.ac.uk